SAN FRANCISCO — Korean wafer foundry DongbuAnam Semiconductor Inc. and EDA giant Synopsys Inc. have jointly developed a reference flow for DongbuAnam's 130-nanometer process, the companies said Friday (Nov. 4).
Synopsys (Mountain View, Calif.) collaborated with DongbuAnam engineers to develop an optimized 130-nm RTL-to-GDSII design flow, named DAS Ref 130.1, based on Synopsys' Galaxy Design Platform, the companies said. The result is an easy-to-adopt reference flow, which addresses key 130-nm design challenges such as power management and signal integrity closure, according to the companies.
Customers of DongbuAnam (Seoul, South Korea) now have immediate access to the DAS Ref 130.1 reference flow, according to the foundry.
"The availability of this jointly developed reference flow is well timed to support new 130-nm chip designs targeting communications and digital consumer electronics applications," said DongbuAnam's Heung-Joon Park, in a statement.
The reference flow incorporates Synopsys' Design Compiler, DesignWare,; JupiterXT, Physical Compiler, Astro, AstroRail, Star-RCXT, PrimeTime, PrimeTime SI, Hercules PVS and TetraMAX.