SAN JOSE, Calif. — The University of Massachusetts Amherst is establishing a nano-imprint lithography laboratory to further its research capabilities in device manufacturing.
The university has received a $700,000 grant from the National Science Foundation to acquire two tools from Molecular Imprints Inc. and Trion Technology Inc. The laboratory will aid in the study of nanotechnology.
Delivery and installation of the new equipment is expected by spring 2006. Orders have been placed for an Imprio 55 step-and-flash nano-imprint lithography machine from Molecular Imprints and a Phantom II reactive ion etch plasma etching system from Trion.
Alfred Crosby, a polymer scientist affiliated with the university’s MassNanoTech Institute, said the new equipment provides an important research asset for creating nanoscale devices for diverse product applications.